专利名称：Substrate processing method, method of
manufacturing micro lens sheet,transmission screen, projector, displaydevice, and substrate processing apparatus
发明人：Kazuto Yoshimura,Jun Amako申请号：US10976248申请日：20041028公开号：US07255806B2公开日：20070814
专利附图：
摘要：A substrate processing method is provided including: shaping a laser beam
emitted from a laser beam source into a beam having a focal depth larger than themaximum value of a variation in thickness of a processing area portion of a processedsubstrate and the maximum value of a variation in bend thereof by making the laserbeam pass through an diffractive optical element; forming plural etching holes byirradiating the shaped beam onto a film formed on the substrate to remove the film; andforming plural recessed portions by etching the substrate through the plural etchingholes.
申请人：Kazuto Yoshimura,Jun Amako
地址：Suwa JP,Matsumoto JP
国籍：JP,JP
代理机构：Harness, Dickey & Pierce, P.L.C.
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