Method of providing aluminium or aluminium alloy t

专利名称：Method of providing aluminium or

aluminium alloy tracks on a substrate

发明人：Van Delden, Martinus Hermanus Wilhelmus

Maria,Van Houtum, Hendrikus JosephusWilhelmus

申请号：EP90202898.4申请日：19901102公开号：EP0427327A1公开日：19910515

摘要：When aluminium tracks are provided on a substrate by first providing on asubstrate a layer of aluminium, and then removing this layer in a certain pattern byplasma etching in a chlorine-containing atmosphere, it is found that chlorine residuesremaining on the substrate promote corrosion of the aluminium tracks. Rinsing in waterturns out to remove these chlorine residues insufficiently. If immediately after plasmaetching in a chlorine-containing atmosphere the product obtained is exposed to a plasmain a nitrogen-containing atmosphere, chlorine residues can subsequently be removed byrinsing with water, which is found to improve effectively the corrosion assistance of thealuminium tracks.

申请人：Philips Electronics N.V.

地址：Groenewoudseweg 1 5621 BA Eindhoven NL

国籍：NL

代理机构：Rensen, Jan Geert

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