专利名称：Method of manufacturing electro-optical
device
发明人：Minoru Moriwaki,Masahiro Yasukawa申请号：US11425569申请日：20060621公开号：US07477334B2公开日：20090113
专利附图：
摘要：A method of manufacturing an electro-optical device, which, on a substrate, hasa plurality of data lines, a plurality of scanning lines, a plurality of driving elementsformed to correspond to intersections of the plurality of data lines and the plurality of
scanning lines for pixels, and a plurality of pixel electrodes provided to correspond to thedriving elements, includes forming an etching stopping layer, forming a common line thatis provided above the etching stopping layer to short-circuit the plurality of scanninglines and the plurality of scanning lines, forming a first interlayer insulating film thatisolates the plurality of data lines and the plurality of pixel electrodes from the pluralityof scanning lines and the plurality of driving elements, forming contact holes thatelectrically connect the plurality of data lines and the plurality of pixel electrodes to theplurality of driving elements, forming the plurality of data lines, and forming a cuttinghole in the first interlayer insulating film by etching so as to cut the common line.
申请人：Minoru Moriwaki,Masahiro Yasukawa
地址：Fujimi-machi JP,Chino JP
国籍：JP,JP
代理机构：Oliff & Berridge, PLC
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